MG CHEMICALS Positive Developer 475ml
For removing exposed resist during the positive photofabrication process.
Disolves exposed photoresist
Concentrated formulation - dilute one part developer to ten parts water
For best results, use in conjunction with M.G. Foam Brush (Cat. No. 416-S)
Also available in the M.G. Photofabrication Kit (Cat. No. 416-K) .